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中小尺寸光罩 -
中小尺寸光罩
主要应用领域： 1.IC/IC bumping用掩模版； 2.MEMS、LED、分立器件用掩模版； 3.光器件、光通讯用掩模版。
铬版精度(Standard Size:6inch Quartz)
| Item/Class | A | B | C | D | E | F | G |
| Min.Line/Space Width on Wafer(4X) | ＞1.0um | 1.0um | 0.8um | 0.5um | 0.35um | 0.2um | 0.15um |
| CD MTT | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.1um | ±0.06um | ±0.05um |
| CD Range | 0.4um | 0.3um | 0.25um | 0.2um | 0.15um | 0.06um | 0.05um |
| Registration Accuracy | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.1um | ±0.08um | ±0.06um |
| Overlay Accuracy | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.1um | ±0.08um | ±0.06um |
| Defect Size | ＜1.5um | ＜1.0um | ＜0.75um | ＜0.5um | ＜0.5um | ＜0.4um | ＜0.2um |
铬版材料 (Photomask blank phate)
材料 | Soda Lime Glass、Quartz |
常规尺寸 | 3006,4009,5009,6012,6025,7012,9012,12"x12",14"x14" |
厚度 | 1.5±0.2mm,2.3±0.2mm ,3.0±0.2mm ,4.8±0.2mm 6.35±0.2mm (QZ) |
铬膜 | Low Reflectance Chrome |
光学密度 (λ=450nm) | Between Plates3.0±0.3 In Plate±0.3 |
反射率 (λ=436nm) | Between Plates10±5% In Plate±2% |
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